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1

Pattern replication accuracy in 1:1 synchrotron radiation lithography

Toshihiko Tanaka, Mitsuaki Morigami, Takeo Watanabe, Motonobu Futagami, Koichi Okada, Shuji Fujiwara, Yoshikazu Yamaoka, Mitsuaki Harada, Kazuhiro Kaneda, Junichi Nishino, Shigeo Suzuki

Journal:

Microelectronic Engineering

Year:

1993

Language:

english

File:

PDF, 1.09 MB

english, 1993

2

Formation of clean stacking faults and oxide microdefects in Czochralski silicon

Futagami, Motonobu

Journal:

Journal of Applied Physics

Year:

1981

Language:

english

File:

PDF, 1.43 MB

english, 1981

3

Distinction Between Clean and Decorated Oxidation-Induced Stacking Faults by Chemical Etching

Futagami, Motonobu

Journal:

Journal of The Electrochemical Society

Year:

1980

Language:

english

File:

PDF, 2.66 MB

english, 1980

4

Influence of Nitrogen Heat-Treatment on Silicon Surfaces

Futagami, Motonobu, Hamazaki, Masaharu

Journal:

Japanese Journal of Applied Physics

Year:

1978

Language:

english

File:

PDF, 120 KB

english, 1978

5

Wafer Temperature Measurement and X-Ray Mask Temperature Evaluation in Synchrotron Radiation Lithography

Chiba, Akira, Futagami, Motonobu, Okada, Koichi

Journal:

Japanese Journal of Applied Physics

Year:

1993

Language:

english

File:

PDF, 395 KB

english, 1993

6

Effect of Helium Gas Pressure on X-Ray Mask Heating during Synchrotron Radiation Exposure

Chiba, Akira, Futagami, Motonobu, Okada, Koichi, Kato, Tadao, NobufumiAtoda,

Journal:

Japanese Journal of Applied Physics

Year:

1995

File:

PDF, 1.02 MB

1995

7

Thermal Etching of a (100) Silicon Surface

Futagami, Motonobu, Hamazaki, Masaharu

Journal:

Japanese Journal of Applied Physics

Year:

1982

File:

PDF, 1.21 MB

1982